Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

Digital, Industry & SpaceHORIZON-RIAID: 101057029
EC Contribution
€56,169
Consortium Size
10 orgs
Start Year
2022
Summary

Laser-based technologies for creating structures in the range from nanometer up to millimeter size find many applications such as free form optics, photonics, multifunctional surfaces, lab-on-chip, etc. with a global market volume of > 200 billion euros. The original structures know as masters are the first step in the making of tools for key-enabling technologies like injection molding or nanoimprinting. Some of the current limitations in the laser lithography processes are the limited depth of the structures, small area and low speed at process level, high-power consumption in the laser interference lithography, and multiple and expensive processes required for the development of hierarchical multifunctional structures at industrial level.The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with (i) high depth (150 micrometer), ii) dimensions in the range from 100 nm to sub-mm in XYZ, iii) 2D&3D shape on flat surface, (iv) combining parallel & serial patterning, (v) no need for external treatments on samples; vi) increased speed (1 cm2/min) and large area (up to 2000 cm2), vii) > 40% of reduction in the consumption of resources for the whole manufacturing process. The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning. By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will reduce the energy consumption, avoid material waste, decrease costs, and lead time in many applications. The platform will potentiate the possibilities in the sustainable making of high quality, versatile, less costly masters for industrial manufacturing, as demonstrated in 4 use cases (optical lenses, multifunctional riblet structures, virtual reality lens, microfluidic chips).

Consortium (10)

Project Results (11)

Source: CORDIS, the EU research results database.

Publications (5)
Combining laser interference lithography and direct write lithography for hierarchical structures fabrication
2024 15th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM)· 2025DOI
D. Mrena, D. Pudis, M. Goraus, Ch. Schuster, A. Voigt, D. Kuhness, Ch. Prietl, L. Kuna, M. Postl
Data-driven optimization of maskless grayscale laser lithography
Scientific Reports· 2025DOI
Adrian H. A. Lutey, David Kuhness, Seyyedhossein Mckee, Vincenzo Ferraro, Marco Negozio, Walter Belardi, Luca Romoli, Markus Postl, Barbara Stadlober
Design and fabrication of hierarchical microstructures for advanced optical applications
Holography: Advances and Modern Trends IX· 2025DOI
Daniel Mrena, Daniel Jandura, Matej Goraus, Dušan Pudiš, Christine Schuster, Anja Voigt, David Kuhness, Christine Prietl, Ladislav Kuna, Markus Postl
Challenges of photomask-based greyscale lithography with a highly-sensitive positive photoresist designed for>100µm deep greyscale patterns
Novel Patterning Technologies 2024· 2024DOI
Christine Schuster, Marina Heinrich, Anja Voigt, Andy Zanzal, Patrick Reynolds, Stephen DeMoor, Gerda Ekindorf, Arne Schleunitz, Gabi Gruetzner
Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist
Proceedings Volume 12497, Novel Patterning Technologies· 2023DOI
Christine Schuster, Gerda Ekindorf, Anja Voigt, Arne Schleunitz, Gabi Grützner
Deliverables (5)
Other Results (1)
Periodic Reporting for period 1 - OPTIMAL (Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning)